Abstract
The thermal stability and structural evolution of titanium thin films deposited in a deuterium atmosphere were studied by x-ray diffraction (XRD), thermal-desorption spectroscopy (TDS), and differential scanning calorimetry. Samples deposited at a 423-K substrate temperature present the fcc ${\mathrm{CaF}}_{2}$-like structure of $\ensuremath{\delta}\ensuremath{-}{\mathrm{TiD}}_{2}.$ TDS experiments showed that deuterium thermal desorption follows a first-order kinetic characterized by a free activation energy of $1.63\ifmmode\pm\else\textpm\fi{}0.03\mathrm{eV}.$ When samples made of the fcc phase were submitted to thermal annealing at 723 K, XRD measurements revealed a crystalline transformation to the hcp \ensuremath{\alpha}-Ti structure. These results indicate that the titanium deuteride decomposition is the rate-limiting process in deuterium desorption. Films deposited at 573- and 723-K substrate temperatures are made of deuterated \ensuremath{\alpha}-Ti: for these samples deuterium desorption followed a second-order kinetics with a free activation energy of $1.53\ifmmode\pm\else\textpm\fi{}0.02\mathrm{eV},$ and the rate-limiting process was the surface recombinative desorption of D atoms.
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