Abstract
ABSTRACTThe results of recent measurements of optical absorption, etching rate and transmission electron microscopy in pure silica and borosilicate glasses are reported and discussed. At dose saturation conditions, the dependence of the optical density associated with the production of single atomic defects from the mass of the impinging particle shows a marked saturation at masses ≥ 20 amu. The corresponding etching rates increase by about 4 times with respect to unirradiated samples. In borosilicate glasses, the temperature dependence of the threshold dose rate of electrons to initiate the nucleation of bubbles shows a marked increase from about 300° to 600° K.
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