Abstract
ABSTRACTStructural effects of sub-monolayer epitaxial films are described by the pair correlation function of surface atoms. We have developed a new scheme to evaluate this atomic pair correlation function analytically and exactly for the combined overlayer and substrate system during the first stages of epitaxy. We employ this correlation function to calculate electron diffraction profiles from model surfaces and compare these calculations to recent LEED measurements of Si/Si(111) and W/W(110) epitaxy.
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