Structural color analysis of the photoresist grating influenced by the light source and its parameters.

Abstract

The basic principle and method to generate structural color from the photoresist grating of the multilayer dielectric diffraction grating are introduced. Rigorous coupled-wave analysis is used for computation with the open software RCWA-1D. The relationships between the characteristics of the photoresist and the structural color are explained. This paper discusses the effect of light source characteristics on the duty cycle color resolution, indicating that TE polarization is better than TM polarization, and the FWHM should be sufficiently large with an optimized value for the incident angle.