Abstract
Transparent and smooth alumina thin films have been deposited on Si (1 0 0) and quartz substrates at low temperature by an off-plane double bend filtered cathodic vacuum arc (FCVA) system, which is slightly different from traditional vacuum arc system. The films were analysed using X-ray diffraction and X-ray photoemission spectroscopy to investigate the crystalline and chemical characteristics of these thin films. The films displayed a very smooth surface morphology, which were verified from AFM and SEM. The compressive stress, hardness and Young's modulus of aluminium oxide thin films deposited under varying oxygen partial pressure were investigated, and compared with that by other technologies. Friction coefficient of stoichiometric film against steel and DLC balls were analysed by tribometer (pin-on-disk), respectively. The deposited stoichiometric aluminium oxide thin films possess good optical properties. The results show that the alumina thin films prepared by FCVA technology have potential applications as wear-resistance coatings and optical coatings.
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