Abstract
LEED (low-energy electron diffraction) intensity studies confirm the formation of epitaxial NiSi 2 on Si {111} with two different rotational orientations (A- and B-type) depending on the initial amount of Ni. The existence of a well-crystallized Si {111}√3 × √3−30°-Ni structure at a surface coverage of 1 3 − 2 3 monolayer is established. The LEED intensities from this structure are found to change after different preparations. These variations can be explained by the existence of at least two equivalent adsorption sites for Ni in each √3 unit mesh, and the coexistence of two rotational domains of the √3 structure at 60° from one another.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
