Abstract
Epitaxial single crystal films of praseodymium nickelate (PrNiO3) have been grown by molecular beam epitaxy on LaAlO3(001) substrates. In-situ electron diffraction and ex-situ X-ray diffraction techniques confirm an epitaxial relationship to the underlying substrate. Crystalline quality depends strongly on the substrate temperature and activated oxygen flux during growth with the highest quality films formed at 600°C under high oxygen plasma fluxes. The metal–insulator transition for PrNiO3 films was suppressed as the crystalline quality of the layers was improved.
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