Abstract
ZnO and Ru multilayer thin films are deposited using the sputtering deposition technique at room temperature. The effects of the Ru interlayer thickness and annealing temperature on the properties of multilayer thin films have been studied. An X-ray diffraction study reveals that ZnO layers are highly c-axis-oriented. The use of an Ru interlayer improves the crystalline quality of the subsequently deposited ZnO layers. Moreover, the crystalline quality of the entire structure is further enhanced through thermal annealing in a vacuum. Atomic force microscopy images show that the surface roughness of the multilayer thin films increases with a Ru interlayer thickness greater than 6nm. The roughness of the film surface increases in correlation with annealing temperatures. This accounts for the decreased optical transmittance of the multilayer thin films annealed at temperatures higher than 450°C. The electrical resistivity of multilayer thin films decreases with an increase in the metallic interlayer thickness. Thermal annealing at 450°C causes low resistivity in multilayer thin films. The lowest resistivity reached ∼5.4×10−4Ωcm for multilayer films with a 10-nm-thick Ru interlayer annealed at 450°C.
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