Abstract

In this paper, we report on Zinc oxide (ZnO) thin films grown by means of simple and cost effective method: Successive Ionic Layer Adsorption and Reaction (SILAR). All the depositions were performed on cheap glass substrates at room temperature. Annealing temperatures and film thickness effect on the structural, morphological and optical properties of the films were investigated. The as-deposited films were annealed at 300 and 400°C for 1 h under oxygen atmosphere. The X-ray diffraction (XRD) and scanning electron microscopy (SEM) characterizations showed that the films covered the whole glass substrates and exhibit the wurtzite hexagonal structure. All the films are nanostructured. The film thickness effect on the band gap values was investigated and band gap values were found to vary within the range 3.2 - 3.8 eV depending on the growth conditions.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.