Abstract

The growth of ferroelectric PbTiO 3 thin films on indium tin oxide (ITO)-coated glass by metalorganic chemical vapor deposition, using Pb(tmhd) 2, Ti(OC 3h 7) 4, and N 2O via thermal pyrolysis with several methods was performed to produce high quality PbTiO 3 films. Scanning electron microscopy showed that the surface of the PbTiO 3 films grown by continuous cooling process (CCP) had a smooth surface without any indications of defects and that the interface between the PbTiO 3 film and ITO-coated glass was abrupt. Atomic force microscopy showed that the PbTiO 3 film grown by the CCP had a smooth surface consisting of hemispherical grains, and optical transmittance measurements showed that the PbTiO 3 grown by the CCP had approximately 80% of the transmittance in the visible wavelength range. The dielectric constant and dissipation factor of the PbTiO 3 film grown by the CCP are the largest and smallest values among those grown by several methods, respectively. These results indicate that the PbTiO 3 thin film grown on ITO-coated glass by CCP can be used for thin-film flat panel-electroluminescent display applications.

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