Abstract
Fluorine doped Tin Oxide (FTO) thin films were deposited on glass substrates by home built spray pyrolysis setup at (400 ± 5)ºC. The method was found to be very economic and functional. The deposited FTO films were highly transparent and had low resistivity. The structural investigation of as-prepared films was performed using X-ray diffraction. Our results showed that a deposited FTO film was of polycrystalline nature with preferential orientation along (211) planes. The direct band gap value was found to be 3.25eV for 10% FTO film. The sheet resistance of this film was measured to be 68 Ω/ square. The effect of fluorine doping concentration on its band gap was also studied in this report.The Himalayan Physics Vol. 6 & 7, April 2017 (58-60)
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
