Abstract
Zn oxide, Ti oxide and Zn-Ti oxide thin films were prepared by vacuum evaporation. Their structural and optical properties have been obtained by X-ray diffractometry (XRD), the energy-dispersive X-ray fluorescence (EDXRF) method and spectrophotometry. The EDXRF method was used to study the stoichiometry of the deposited Zn-Ti oxide films. The XRD patterns show that the prepared ZnO and Zn-Ti oxide films were polycrystalline, while Ti oxide films were amorphous. Spectroscopic optical constants n(λ) and k(λ) as well as the energy gap Eg were evaluated from spectrophotometry in the interband transition energy region. It was discovered that ZnO–TiO thin films remain transparent in a shorter wavelength range than the ZnO thin films, resulting from the slight increase of their band gap. It was found that n, k and transmittance values for the mixed-oxide film vary smoothly between the values of the pure constituent oxides in the fundamental energy gap region.
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