Abstract
The Al-doped ZnO (AZO) films were deposited on glass by RF magnetron sputtering under different sputtering power: 75W, 120W, 160W and 200W. During the films deposition, the other sputtering conditions were maintained constant. The crystal structures of the AZO films were characterized and analyzed by X-ray diffraction. The surface morphologies of the films were observed by SEM. The transmission spectra of the films were measured using a spectrophotometer within the range from 200 to 800 nm at room temperature. The results indicate each of the films has a preferential c-axis orientation and the grain size increases with the increase of sputtering power. All the films exhibit a high transmittance in visible region and have sharp ultraviolet absorption characteristics.
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