Abstract
The structure, chemical composition, and optical properties of tungsten trioxide thin films grown by pulsed laser deposition were investigated. An ultraviolet KrF* excimer laser (λ=248nm, τFWHM≅20ns, ν=2Hz) was used for irradiation of tungsten trioxide targets in oxygen atmosphere. Our research focused on the effect of the ambient gas pressure and substrate temperature on the chemical composition, crystalline status, and optical properties of the obtained thin films. To this end, the films were studied by x-ray diffractometry Raman spectroscopy, and energy dispersive x-ray spectroscopy. Optical transmittance measurements were performed with a double beam spectrometer within the 400–1200nm range. The films deposited at oxygen pressure values higher than 10Pa and substrate temperatures above 300°C consist of crystalline tungsten trioxide. Their average transmittance in the visible-infrared spectral region reaches about 85% appropriate for the envisaged applications.
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