Abstract
The development of Dye-Sensitized Solar Cell (DSSC) technology by utilizing various semiconductors has attracted attention. Among all types of semiconductors, the nanostructure of ZnO is selected due to their unique electrical properties and ease of preparation in various morphologies, and it has been considered a promising material to be applied in DSSC. In this research, the DC magnetron sputtering method was used to prepare ZnO thin films as an efficient alternative to press the charge recombination process that occurs in TiO2-based DSSC. Different thicknesses of TiO2 layers on the FTO conductive glass substrate were made through various sputtering deposition times, while the ZnO nanorod layers were made with a single layer using the hydrothermal method. We used XRD, SEM, UV-Vis, I-V meter, and EIS analysis. Based on these characterization we concluded that multilayer ZnO nanorod:TiO2 coating with a sputtering time of 60 minutes resulted the best performance of DSSC with an efficiency of 0.27%.
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