Abstract
Tix Al1−xN coatings were grown using the triode magnetron sputtering technique varying the bias voltage between -40 V and -150V. The influence of bias voltage on structural and morphological properties was analyzed by means of energy dispersive spectroscopy, x-ray diffraction and atomic force microscopy techniques. As the bias voltage increased, an increase inthe Al atomic percentage was observed competing with Ti and producing structural changes. At low Al concentrations, the film presented a FCC crystalline structure; nevertheless, as Al was increased, the structure pre-sented a mix of FCC and HCP phases. On the other hand, an increase inbias voltage produced a decrease films thickness due to an increase in colli-sions. Moreover, the grain size and roughness were also strongly influencedby bias voltage.
Highlights
Hard coatings for wear reduction of cutting tools, like TiN, TiCN and TiAlN are well established
The elemental concentration in TiAlN coatings has a strong influence on several properties as the oxidation resistance, hardness and wear resistance [24]
Results presented by Mayrhofer [26], indicate that the FCC phase stability is determined by the number of Ti-Al bonds that depends on the ionization induced by the increase in VS
Summary
Hard coatings for wear reduction of cutting tools, like TiN, TiCN and TiAlN are well established. Regarding to TiAlN, recent improvements in the life of cutting tools have been achieved by the development of titanium aluminum nitride (Ti,Al)N coatings [2]. Films such as TiAlN display a unique combination of properties as high hardness at elevated temperature together with thermal and chemical stability, as well as low thermal conductivity [3],[4],[5]. These materials have been considered for bioimplants [6]. Several methods have been used for growing TiAlN as monolayer and as multilayers coatings, such as multi-arc physical vapor deposition [7], pulsed laser deposition [8], ion plating [9], among others
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