STRUCTURAL AND MORPHOLOGICAL PROPERTIES OF ANNEALED MoO3 FILMS ON DIFFERENT SUBSTRATES

Abstract

Molybdenum oxide (MoO3) films were deposited on glass, Al, Mo and Si substrates at room temperature in Ar-O2 plasma by RF magnetron sputtering system. The as-deposited films were annealed in air at 400∘C and 500∘C. X-ray diffraction (XRD) results revealed that films annealed at 400∘C on all the substrates exhibited diffraction peaks of orthorhombic (α) and monoclinic (β) phases of MoO3. By increasing the annealing temperature to 500∘C, the [Formula: see text]-MoO3 phase on glass became more significant when compared with the [Formula: see text]-MoO3 phase. In contrast, the [Formula: see text]-MoO3 phase was more prominent in the case of film grown on the Mo substrate. The Fourier transform infrared spectroscopy (FTIR) analysis indicated stretching vibrational modes of Mo[Formula: see text]O and transverse optical modes of Mo-O-Mo on all the substrates. The surface morphology of MoO3 films on glass shows a flat surface at 400∘C that was changed into a layered-like structure at 500∘C. In the case of MoO3 films on Al and Si, arbitrary-shaped particles were transformed into needle and rod shapes, respectively, with increase of annealing temperature from 400∘C to 500∘C. The film annealed on Mo substrate at 400∘C revealed corrugated particles that were changed into coarse and elongated particles at 500∘C. The morphological changes in MoO3 film with increase of annealing temperature were associated with tensile strain developed inside MoO3 due to lattice and thermal mismatch between the film and the substrate.