Structural and mechanical properties of ZrN films prepared by ion beam sputtering with varying N 2/Ar ratio and substrate temperature

Abstract

Zirconium nitride (ZrN) films were deposited by ion beam sputtering technique on stainless steel 304 substrates using a mix of (Ar+N 2) gas. In this paper, the effects of N 2/(N 2+Ar) flow ratio ( F(N 2)) and substrate temperature on the microstructure and microscopic properties of the deposited films were investigated. The phase and the morphology were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM) respectively; moreover, the composition depth profile of ZrN was obtained using secondary ion mass spectroscopy (SIMS). In a wide range of F(N 2) (10–54%), the intensity of (1 1 1) peak increased which was the preferred orientation, while for F(N 2) more than 54% the ZrN peak intensity was decreased and the amorphous structure was formed at 95%. The XRD patterns presented a texture change due to the processing temperature, which was varied within the range 200–550 °C. At 400 °C, the (1 1 1) crystalline plane intensity was higher than the other ones, leading to the presence of a preference for this orientation. Good planarity of the deposited films was confirmed by SEM, it did not reveal any undulations, fractures, or cracking. The Vickers micro-hardness tester with a load of 25 g was used to measure the hardness of the films. The results showed that the structural and mechanical properties were strongly influenced by nitrogen ratio and substrate temperature.