Abstract

Multilayered films have emerged as an attractive choice of coating material in magnetic recording media and magneto-resistance device related applications. These films possess advantages such as excellent magnetic properties, good corrosion resistance and high chemical stability. Hence, it is imperative that their structural and magnetic properties be characterized so that they can be tailored for specific applications. The present study aims towards the development and characterization of Platinum (Pt)/Cobalt (Co) multilayer films for magnetic and structural properties. Pt/Co multilayered films were deposited on Silicon (Si) substrate using dual electron beam co-evaporation. Four layers of each Pt and Co were deposited on a Si substrate, forming a multilayer film. Controlled deposition rates were used in order to attain the desired thickness of Co and Pt layers. The films were characterized using scanning and transmission electron microscopy and surface profilometry. Magnetic property measurements were conducted on these films in both perpendicular and parallel orientations, in order to understand the correlation between structure of various constituent elements of the film and their magnetic behavior. Results are analyzed and compared with those obtained from previous studies on similar multilayer films, to gain a better understanding of the effect of various parameters on properties of the film.

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