Abstract

Polycrystalline thin films of La2NiMnO6 (LNMO) are deposited successfully on SiO2/Si substrates using pulsed laser deposition technique. Structural characterization using X-ray diffraction confirms the formation of a single phase with P21/n space group. Cross-sectional FE-SEM shows the film thickness ∼195 nm. The deposition temperature and the oxygen pressure played a crucial role determining the crystallization behavior and the magnetic transition temperatures. The ferromagnetic transition temperature is achieved to be ∼277 K by optimizing the deposition conditions.

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