Abstract
The results of structural and magnetic investigations of nanogranular Co–Al2O3 films formed from Co3O4/Al thin-film layered structures upon vacuum annealing are reported. The Co3O4/Al films have been obtained by sequential reactive magnetron sputtering of a metallic cobalt target in a medium consisting of the Ar + O2 gas mixture and magnetron sputtering of an aluminum target in the pure argon atmosphere. It is shown that such a technique makes it possible to obtain nanogranular Co–Al2O3 single- and multilayer thin films with a well-controlled size of magnetic grains and their distribution over the film thickness.
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