Abstract
Tin oxide (SnO2) films have been grown on r-cut sapphire substrates by metalorganic chemical vapor deposition (MOCVD). The substrate temperature dependent structural and electrical properties of SnO2 films were investigated. It was found that the films deposited at lower temperatures were polycrystalline while the highly oriented growth occurred above 600 °C. Especially, high-quality SnO2 film with no (101) twin structure was obtained at 700 °C. Scanning electron microscopy showed that the surface morphology was significantly affected by the substrate temperature. A tile-like surface was observed for the film grown at 700 °C. The change in electrical properties for the SnO2 films was associated with the various structures at different substrate temperatures.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
