Abstract
AbstractThe crystal structure, composition and surface composition of sputtered nickel ferrite films have been studied. The films have been prepared by sputtering in argon and reactively sputtering in oxygen from a nickel ferrite cathode and from an invar alloy cathode. Nickel ferrite has been identified as the main constituent of these films. XPS and AES have been used to study the surface composition of these sputtered films and NiFe2O4 and oxides and hydroxides of nickel and iron have been identified on the surface. Only films sputtered in argon from a nickel ferrite cathode were found to have the exact nickel ferrite composition. The deposition of these films onto single crystal MgO, a suitable substrate for epitaxial growth, has also been studied. AES results after annealing at 1000 °C indicate that for thin films, nickel and iron diffuse into the MgO substrate.
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