Abstract
The effect of composition of ZrN and TiN films and deposition temperature on lattice expansion was investigated. ZrN and TiN films containing various at.% of nitrogen were prepared by reactive sputter deposition in a Balzers Sputron plasma beam apparatus. Both ZrN and TiN films were grown at a substrate temperature of 180°C and some of the ZrN films also at substrate temperatures between 400 and 700°C. Interplanar distances and textures were determined using Seeman-Bohlin and Bragg-Brentano X-ray diffraction.
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