Abstract
ABSTRACTWe have recently reported the fabrication of Si based subnanometer linewidth microcavities and omnidirectionnal mirrors. The structures were made of microporous silicon by electrochemical anodization. The structure high quality and the observation of omnidirectionnal stop bands have been made possible by the optimisation of the starting material, the etching conditions, and the structure design. In this paper we discuss more specifically the choice of these parameters considering the material intrinsic limitations.
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