Abstract
We select the boron as a dopant of wide bandgap nanocrystalline silicon-carbide (nc-SiC:H) film in order to achieve a high conductivity. Boron atoms introduced at the growing surface play important roles on the structural, electrical and optical characteristics of this material. It is found that they hinder the nucleation of nanocrystallites by elevating the deposition speed. Therefore, a relevant light doping is essential to improve the electrical conductivity without deteriorating significantly the crystallinity and optical bandgap.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
