Strong electroluminescence from SiO2-Tb2O3-Al2O3 mixed layers fabricated by atomic layer deposition

Abstract

We report on the bright green electroluminescence (EL) with power efficiencies up to 0.15% of SiO2-Tb2O3-mixed layers fabricated by atomic layer deposition and partly co-doped with Al2O3. The electrical, EL, and breakdown behavior is investigated as a function of the Tb and the Al concentration. Special attention has been paid to the beneficial role of Al2O3 co-doping which improves important device parameters. In detail, it increases the maximum EL power efficiency and EL decay time, it nearly doubles the fraction of excitable Tb3+ ions, it shifts the region of high EL power efficiencies to higher injection currents, and it reduces the EL quenching over the device lifetime by an approximate factor of two. It is assumed that the presence of Al2O3 interferes the formation of Tb clusters and related defects. Therefore, the system SiO2-Tb2O3-Al2O3 represents a promising alternative for integrated, Si-based light emitters.