Stretching-tunable metal gratings fabricated on an elastomeric substrate using a water-soluble sacrificial layer

Abstract

We report a new method to fabricate stretching-tunable metal gratings on elastomeric substrates by combining nanoimprint lithography and metal transfer using a patterned sacrificial layer. Fabrication of metal lines with a period of 550 nm and a linewidth of 270 nm was demonstrated on polydimethylsiloxane (PDMS) membranes using this process. Optical diffraction characterization was used to measure the period of stretched gratings on the PDMS membrane and demonstrates tuning of the grating period by deforming the carrying PDMS substrate. The pattern transfer process using a water-soluble sacrificial layer can also be applied to fabrication of other deformable micro- and nano-devices.