Stretchable HfO2-Based Resistive Switching Memory Using the Wavy Structured Design

Abstract

In this letter, we report a stretchable HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> -based resistive switching memory device utilizing the wavy structured strategy. The fabricated Cu/HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> /Au device shows reliable and reversible resistive switching behaviors up to a stretching strain of 20%. After being released, the reproducible memory characteristics of the device can still be maintained. The statistical resistive switching parameters under various stretching strains in the range from 0% to 20% are counted, which exhibit a large OFF/ON resistance ratio (10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sup> ), low operation voltage (2 V), good endurance and retention (10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</sup> s), demonstrating the good and reliable stretchable memory characteristics. Moreover, the device-to-device distributions are carried out in these stretched states, further validating the device robustness on stretching strains. Our results show a promising approach to achieve the stretchable memory by rendering inorganic-based resistive switching devices with the wavy structure, which extends rigid and brittle memory towards future highly flexible, even stretchable data storage and computing.