Abstract

The dependence of decomposition routes on intrinsic microstructure and stress in nanocrystalline transition metal nitrides is not yet fully understood. In this contribution, three Al0.7Cr0.3N thin films with residual stress magnitudes of −3510, −4660 and −5930 MPa in the as-deposited state were in-situ characterized in the range of 25–1100 °C using in-situ synchrotron high-temperature high-energy grazing-incidence-transmission X-ray diffraction and temperature evolutions of phases, coefficients of thermal expansion, structural defects, texture as well as residual, thermal and intrinsic stresses were evaluated. The multi-parameter experimental data indicate a complex intrinsic stress and phase changes governed by a microstructure recovery and phase transformations taking place above the deposition temperature. Though the decomposition temperatures of metastable cubic Al0.7Cr0.3N phase in the range of 698–914 °C are inversely proportional to the magnitudes of deposition temperatures, the decomposition process itself starts at the same stress level of ~−4300 MPa in all three films. This phenomenon indicates that the particular compressive stress level functions as an energy threshold at which the diffusion driven formation of hexagonal Al(Cr)N phase is initiated, provided sufficient temperature is applied. In summary, the unique synchrotron experimental setup indicated that residual stresses play a decisive role in the decomposition routes of nanocrystalline transition metal nitrides.

Highlights

  • The dependence of decomposition routes on intrinsic microstructure and stress in nanocrystalline transition metal nitrides is not yet fully understood

  • Thermal stability of the metastable AlCrN thin films was investigated in the temperature range between room temperature (RT) and 1100 °C by analysing Debye-Scherrer rings for the detector azimuthal angles δ in the range of 0 to −180 deg by a sectoral integration of the patterns, as the rest of the data, corresponding to the δ complementary angles, comprised mostly diffraction signal from the WC-Co substrate

  • The featured 111 and 200 reflections indicate that the Al0.7Cr0.3N thin film deposited at TS, B = 400 °C was at RT in metastable state and possessed the face-centred cubic B1 (c) structure

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Summary

Introduction

The dependence of decomposition routes on intrinsic microstructure and stress in nanocrystalline transition metal nitrides is not yet fully understood In this contribution, three Al0.7Cr0.3N thin films with residual stress magnitudes of −3510, −4660 and −5930 MPa in the as-deposited state were insitu characterized in the range of 25–1100 °C using in-situ synchrotron high-temperature high-energy grazing-incidence-transmission X-ray diffraction and temperature evolutions of phases, coefficients of thermal expansion, structural defects, texture as well as residual, thermal and intrinsic stresses were evaluated. In the case of transition metal nitride hard thin films, in-situ synchrotron XRD has been used to study temperature-dependent phenomena and physical parameters like phase evolution, lattice parameters and/or in-plane strains (i) in powders of TiAlN and TiCrAlN films and (ii) in thin slices of TiAlN and TiZrAlN films in transmission diffraction geometry[17,18,19,20,21] The former experiments concentrated mostly on the understanding of complex decomposition routes and related lattice parameter/strain changes. The multi-parameter temperature-dependent structure-property correlations indicate a decisive role of residual stress magnitude in the decomposition routes of metastable c-AlCrN

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