Abstract
Shape memory alloy (SMA) films have been so far deposited on planar Si, metallic and polymeric surfaces and investigated either in the detached or attached two-way SM states. It has been shown that uniform film stresses which are introduced during cooling from the processing temperature effect the transformation characteristics significantly. It is also known that non-planar surfaces are conducive to graphoepitaxial growth. In this paper the authors show that the density of martensite plates in a corrugated (Ni{sub 50}Ti{sub 50} film)/(Si substrate) composite corresponds to the density of pyramidal etch patterns in the substrate and propose that the non-uniform stress state gives rise to local stress induced formation of martensite.
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