Abstract

AbstractThe evolution of stress vs. temperature was measured during the formation of TiSi2 in the reaction of Ti with (100) Si and with polycrystalline Si, and during the phase transformation from C49 to C54 TiSi2. The formation of C49 TiSi2 causes an increase in compressive stress, followed by relaxation before the transformation to C54 TiSi2, which causes no significant stress change. C54 TiSi2 is shown to be elastic in the temperature range of 750–860 °C. This difference in the deformation mechanisms of C49 and C54 TiSi2 affects the morphological stability of TiSi2 in fine line structures.

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