Stress Dependence of Optically Active Diamagnetic Point Defects in Silicon Oxynitride

Abstract

The cathodoluminescence (CL) spectrum arising from diamagnetic point defects of silicon oxynitride lattice was analyzed to extract quantitative information on local stress fields stored on the surface of a silicon nitride polycrystal. A calibration procedure was preliminarily made to obtain a relationship between CL spectral shift and applied stress, according to the piezo-spectroscopic effect. In this calibration procedure, we used the uniaxial stress field developed in a rectangular bar loaded in a four-point flexural jig. Stress dependence was clearly detected for the most intense spectral band of a doublet arising from diamagnetic ([triple bond]Si-Si[triple bond]) defects, which was located at around 340 nm. The shallow nature of the electron probe enabled the characterization of surface stress fields with sub-micrometer-order spatial resolution. As applications of the PS technique, the CL emission from [triple bond]Si-Si[triple bond] defects was used as a stress probe for visualizing the residual stress fields stored at grain-boundary regions and at the tip of a surface crack propagated in polycrystalline silicon nitride.