Abstract
[Co (tCo) nm/Cu 1.5 nm]50 multilayers were grown onto 15-nm Cu/polyimide buffer layers. The relationship between stress, σ, and strain, ɛ, for the [Co 1.0 nm/Cu 1.5 nm]50 multilayers has been presented. The effects of induced strain on the magnetoresistance (MR) and magnetic anisotropy have been examined. The [Co 1.0 nm/Cu 1.5 nm]50 multilayer exhibited a maximum MR ratio of 3.4% at a Co layer thickness of 1.0 nm, β of 0.1, and a strain of 1.5%. The multilayers exhibited a remarkable magnetic anisotropy with the easy axis of magnetization always lying in a plane perpendicular to the direction of the induced strain.
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