Strain hardening behavior of Ni-carbonyl Chemical Vapor Deposited (CVD) material with bimodal grain structures: Ultrafine (UF) grains and large grains with UF/nano twins

Abstract

Through Ni-carbonyl CVD process, bulk Ni material (hereafter referred as CVD Ni) with bimodal grain structures, i.e. UF grains and large grains with UF/nano twins, can be produced. In tensile test, this material demonstrated a very good combination of strength and ductility as well as a special strain hardening behavior. Upon investigating the material's hardening behavior, a critical threshold strain, εc, of 0.02 was identified for the distinct change in the strain hardening behavior. Prior to this strain level, the strain hardening rate of the CVD Ni was found always higher than that of its counterpart coarse-grained (CG) Ni; but it dropped, after this strain, to the same level as the CG material. Furthermore, through the analysis of results from Tension Unloading Reloading-in-Tension (TURT) tests, this specific strain value was also found to be significant in the change of the hysteresis loop width as well as the back stress strain hardening responsible for the material's Bauschinger behavior. Microstructural evolution examination suggests that most of the twin boundaries (TBs) initially acted as obstacles to dislocation movement providing strong dislocation back stress and hence contributing to the strong hardening behavior. From the strain level of 0.02 and onwards, however, massive detwinning was detected which is responsible for the drop in the hardening rate. Finally, dislocation cell structures, that were typically evolved from entanglements of dislocation inside CG Ni, were also found inside the detwinned large grains of CVD Ni in the high strain regime, which yielded similar strain hardening behavior as in the CG Ni material.