Abstract

Strain compensation in ternary Si 1 − x − y Ge x B y films deposited by RTCVC with x = 0.2 and y ≤ 0.2 was demonstrated. The strain estimated by double crystal X-ray diffraction decreases with increasing boron content due to the decrease of lattice constant by incorporation of boron. The boron concentration estimated for the strain compensation effect obtained and the density of holes calculated from Raman measurements are smaller than the total amount of incorporated boron. That indicates that only a part of the total boro content is substitutional boron.

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