Abstract
The influence of sputtering conditions on the composition of MoS x films was investigated. It was found that a rather low argon pressure as well as a substrate bias potential causes a high sulphur deficiency in the sputtered layers compared with the target material; this can be compensated by using an Ar-H 2S sputtering atmosphere. The frictional behaviour of these layers depends strongly on the actual layer composition. Pressure-dependent changes in the coefficient of sliding friction are observed under high vacuum conditions as well as in a nitrogen atmosphere.
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