Abstract
The initial stages of adsorption and decomposition of the organometallic chemical vapour deposition precursor bis(hexafluoroacetylacetonato)copper(II) on Si(111)-(7 × 7) have been investigated using scanning tunnelling microscopy (STM), X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and Rutherford backscattering (RBS) spectroscopy. This combination of techniques has allowed the chemical identification and quantification of the features observed in the STM images. Even though each precursor molecule releases a single Cu atom, the Cu atoms form clusters which contain on average 10 ± 2 atoms over a wide range of total coverage (below one monolayer) on a room temperature substrate. The Cu clusters are physically separated from the organic ligands which are themselves adsorbed in clusters on the surface. Possible mechanisms for this surprising behaviour are postulated.
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