Abstract
Stimulated emission at bandgap energy of 1.1 eV was observed in a silicon nanostructured pn junction diode using current injection at room temperature. Nonuniform diffusion using spin-on boron dopant mixed with silicon dioxide nanoparticles was used to fabricate the device. The spatial confinement of carriers through such localization structures contributes to the enhancement of the stimulated emission. The experimental results show a drastic increase in the optical power and multiple spectral peaks at wavelengths longer than the main peak of spontaneous emission through various phonon-assisted radiative recombination processes. When the injection current significantly exceeds a threshold, a single peak dominates, exhibiting stimulated emission.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.