Stereometric analysis of Ti1- x Alx N thin films deposited by direct current/radio frequency magnetron sputtering.

Abstract

A study of image analysis of Ti1-x Alx N films deposited on corning glass substrates by a direct current (DC)/radio frequency (RF) magnetron sputtering system was performed. Atomic force microscopy (AFM) data were studied to understand how the impact of the concentration of Al content influences the 3D surface morphology as well as the surface texture parameters. The results showed that the superficial morphology was modified by the increase of Al content in the Ti1-x Alx N films, as well as the surface microtexture. It has also been observed that the Ti1-x Alx N film surface with the highest aluminum (Al) doping concentration presented a similar surface morphology to pristine titanium nitride (TiN) thin films. The Abbott-Firestone curves for all films exhibited an S-like shape suggesting topographic uniformity and Gaussian distribution of heights. An increase in surface uniformity is observed with Al concentration. The characterization of the surface morphology of Ti1-x Alx N films by the evaluation of surface statistical parameters suggests that the surface topography can be adjusted by suitable doping of aluminum and offers a deeper understanding of the applicability of these films.