Abstract

For far-field optical imaging of three-dimensional objects and such critical applications as quantitative optical imaging, optical metrology, and optical lithography, it is necessary not only to meet the Kohler illumination condition (i.e. uniform spatial intensity) but also to minimize angular illumination asymmetry (ANILAS) at the sample plane. The presence of ANILAS results in distorted optical images, and most likely in erroneous quantitative measurements. ANILAS results from optical and illumination aberrations, optical misalignment and other problems. We present a detailed procedure to measure and create maps of ANILAS across the field-of-view (FOV). ANILAS maps enable visualization of the state of illumination at the sample plane. Since the presence of ANILAS is detrimental to quantitative measurements, it is important to know the magnitude and type of ANILAS across the FOV before making any attempt to correct it. Here we intentionally create different types of illumination distortions and generate corresponding ANILAS maps, which help us evaluate the state of illumination beyond the Kohler illumination criterion. We expect that the ANILAS maps will be helpful for a wide range of far-field imaging applications.

Highlights

  • Usage of the far-field optical imaging technique for quantitative measurements has been increasing in recent years

  • We present a detailed procedure to measure and create maps of Angular Illumination ASymmetry (ANILAS) across the field-of-view (FOV)

  • Since the presence of ANILAS is detrimental to quantitative measurements, it is important to know the magnitude and type of ANILAS across the FOV before making any attempt to correct it

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Summary

Introduction

Usage of the far-field optical imaging technique for quantitative measurements has been increasing in recent years. Standardization and calibration of optical microscopy systems have become important due to the increasing role of biological imaging in high-content screening technology [1]. The field of sectioning fluorescence microscopy has rapidly advanced in recent years, allowing experimenters the opportunity to extract more and more information from a given sample by utilizing spectral analysis in multispectral systems, high temporal resolution in fast imaging systems, and high spatial resolution in systems employing molecular switches or structured illumination [2]. Far-field imaging optical tools are required for semiconductor metrology and optical lithography [6,7,8]. Use of optical imaging for forensic examination of bullets and cartridge cases to uniquely identify ballistic signatures requires high-quality optical systems [11, 12]

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