Statistically Correlating Laser-Induced Damage Performance with Photothermal Absorption for Fused Silica Optics in a High-Power Laser System

Abstract

Photothermal weak absorption is useful for the diagnosis of absorbing defects on the surface of fused silica optics in high-power lasers. However, how they relate to the laser-induced damage performance remains unclear, especially for a fused silica surface that has been post-treated with different processes (e.g., dynamic chemical etching or magnetorheological finishing). Here, we present a correlation study on the surface defect absorption level and laser-induced damage performance of fused silica optics post-treated with different processes using the photothermal common-path interferometer method. Statistical distribution of the absorbing defects at various absorption levels is obtained. The relationship between the defect density and the laser damage performance was analyzed. We show that the surface absorbing defects of fused silica can be affected by the post-treatment type and material removal amount. Furthermore, we show that the density of the defects with the absorption over 2 ppm is strongly correlated with the damage initiation threshold and damage density. Especially, for high-density defects at this absorption level, the damage density of fused silica optics can be well-predicted. In the low-density range, the density of this kind of defect can reflect the zero-probability damage threshold well. The study exhibits the potential of this methodology to non-destructively detect the key absorbing defects on fused silica surfaces as well as evaluate and optimize the post-treatment level of fused silica optics for high-power laser applications.