Abstract
The correlation between sputtering and several features of individual cascades is investigated with the trim.sp program. A comparison with other simulation models indicates that the sputtering statistics is not deeply influenced by the target model. Also, the distributions of sputtering related quantities were found quite similar when resulting from cascades generated by particles which are implanted or backscattered, although the number and the distribution of displacements produced can be well distinguished. A partition of the individual cascades is made based on the sputtering frequency. The sputtering energy distributions are found similar in all classes. These features illustrate the similarity between the statistics of sputtering from individual and statistical cascades. The situation is different as the relation between the number of sputtered atoms and the surface deposited energy is concerned. The same number of sputtered atoms is associated with a broad distribution of deposited energies. Their profile is dependent on the number of sputtered atoms, and the sputtering frequency is not always linearly dependent on either the mean or the mode of the surface-deposited energy distribution. Finally, a surface-deposited energy threshold is emphasized for sputtering, which correlates to the anisotropy of the momentum flux distribution in the vicinity of the surface.
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