Statistical modeling of the ion-plasma sputter deposition of thin YBa2Cu3O7−x high-temperature superconductor films

Abstract

A model of the process of thin multicomponent film deposition by ion-plasma sputtering of amorphous and polycrystalline targets has been developed. Using this model, the film deposition rates and the film thickness homogeneity over the substrate have been evaluated for thin films of high-temperature superconductors based on YBa2Cu3O7−x (YBCO) ceramics. A comparison of the results of numerical simulations based on the proposed model and the experimental data on the YBCO film deposition rates showed that the model provides for a sufficiently correct description of the ion-plasma sputter deposition process. The results were used for optimization of the technology of ion-plasma sputter deposition of thin multicomponent films. The model of the deposition process is applicable in the range of sputter ion beam energies up to 1–3 keV, which is of interest for many basic problems and technological applications involving the process of ion and ion-plasma sputtering of multicomponent materials.