States of Particles in DC Magnetron Sputtering Deposition of Titanium Metallic

Abstract

A DC magnetron sputtering of titanium metallic was diagnosed in terms of the states and the spatial distribution of particles in the plasma by a single Langmuir probe. The investigations were carried out with the deposition system previously reported with high quality titania films and under described conditions. The simple experimental set-up had been known for decades but with caution on the extremely complicated of analyses. The experimental accuracy and the plasma characteristics obtained must not only be discussed with theoretical treatments, however, the refinement of the whole process deems necessary. The concurrent of results; the transport of atoms by the knowledge of magnetic field profiling coupled with electron density distributions, the energetic of particles which believed to be responsible for differences in phases formation, would vividly explains the deposition process of the films. Furthermore, the results obtained with a variety of theoretical treatments whether a Maxwellian/non- Maxwellian distribution and on viable of collisionless plasma and the generation of secondary electrons would be discussed with the measured data.