Abstract

The field of two-dimensional (2D) materials has expanded to multilayered systems where electronic, optical, and mechanical properties change-often dramatically-with stacking order, thickness, twist, and interlayer spacing [1-5]. For transition metal dichalcogenides (TMDs), bond coordination within a single van der Waals layer changes the out-of-plane symmetry that can cause metal-insulator transitions [1, 6] or emergent quantum behavior [7]. Discerning these structural order parameters is often difficult using real-space measurements, however, we show 2D materials have distinct, conspicuous three-dimensional (3D) structure in reciprocal space described by near infinite oscillating Bragg rods. Combining electron diffraction and specimen tilt we probe Bragg rods in all three dimensions to identify multilayer structure with sub-Angstrom precision across several 2D materials-including TMDs (MoS2, TaSe2, TaS2) and multilayer graphene. We demonstrate quantitative determination of key structural parameters such as surface roughness, inter- & intra-layer spacings, stacking order, and interlayer twist using a rudimentary transmission electron microscope (TEM). We accurately characterize the full interlayer stacking order of multilayer graphene (1-, 2-, 6-, 12-layers) as well the intralayer structure of MoS2 and extract a chalcogen-chalcogen layer spacing of 3.07 +/- 0.11 Angstrom. Furthermore, we demonstrate quick identification of multilayer rhombohedral graphene.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.