Stable DC vacuum arc plasma generation from a 100 mm TiB2 cathode

Abstract

Titanium diboride exhibits outstanding properties for hard and wear resistant coatings. However, efficient physical vapor deposition (PVD) processing through DC vacuum arc, with a deposition rate unreachable for any other PVD technique, is comparatively unexplored for TiB2 thin films due to challenges associated with the film synthesis process. In this work, we used an industrial scale arc plasma source having a plane cathode of 100 mm in diameter and a permanent magnet on its back side. We present analysis of the cathode surface, plasma generation/composition, as well as analysis of collected macroparticles. The cathode weight loss and the amount of generated macroparticles were measured as a function of process parameters (arc current and pressure, in both Ar and N2 gas). Plasma analysis shows average ion energies around 120 and 25 eV for Ti and B, respectively, and plasma ion composition of approximately 50 % Ti and 50 % B. The cathode weight loss was around 0.3–0.5 g/min, of which at least 25 % is estimated to be macroparticles. Notably, the intensity of the macroparticle generation was reduced with an increase in N2 pressure. Altogether, the results show a stable and reproducible plasma generation process and a high potential for the use of the cathodic arc as an efficient and useful method for deposition of metal borides.