Abstract
The extent of surface oxidation controls the stability of silicon carbide aqueous suspensions. In the present study, x-ray photon spectroscopy (XPS) was used to determine the extent of oxygen on as-received and oxidized silicon carbide whiskers. The isoelectric points at pH 6.0 and pH 4.0 for the as-received and oxidized whiskers, respectively, correlated with the XPS analyses, indicating essentially a silica surface on the oxidized whiskers and both Si-O and Si-C bonds on the surface of the as-received whiskers. Suggestions are made regarding the utility of the oxidation treatment in processing whisker-reinforced ceramics.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
