Abstract
The processing and properties of different types of NiFe/stabilization films, for use in multi-track dual-stripe MR read heads, is described. The films were deposited in situ, after an etch step, using collimated deposition, and with minimal re-deposition. It was found that this deposition method provided the necessary device fabrication and dimensional control. Despite the limitations imposed by the deposition rate, pressure, and substrate bias, we demonstrate that optimal film properties can be achieved using this deposition technique. It was found that the properties of both permanent magnet and antiferromagnetic films were affected by the underlying NiFe surface, and the overlaid film affected the magnetics of the NiFe.
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