Abstract
The photocatalytic activity and stability of TiO2 thin films deposited by reactive sputtering were evaluated through many cycles of aqueous methylene blue solutions photodegradation. Tests were performed in TiO2 films deposited onto silica, silicon, and lanthanum aluminate substrates under UV light irradiation. The dye degradation was determined using the optical absorbance spectra at pre-established exposure times. After 16 cycles of reaction, 180 minutes each, no systematic losses in the photocatalytic activity were observed in the samples. The best activity was observed on films deposited onto silica glass. The results indicate that the TiO2 samples deposited by the sputtering technique are stable concerning the UV degradation of methylene blue.
Highlights
Photocatalysis produced by TiO2 compounds has gained attention since the discovery of such phenomenon, by Fujishima and Honda[1]
The TiO2 films produced by reactive sputtering displayed photocatalytic activity when deposited on different substrates
Concerning the reaction kinetics, the results indicated are more compatible with the reaction being of second or third order but further characterizations of the intermediate reactions are needed to generate more in-depth conclusions about this point
Summary
Photocatalysis produced by TiO2 compounds has gained attention since the discovery of such phenomenon, by Fujishima and Honda[1]. The advanced oxidative process described as a mechanism with which the photocatalysis can oxidize pollutants is based, mainly, on the irradiation of light with energy higher than the material’s bandgap[7,8,9,10,11]. In this process, it is well established that the electrons in the conduction band (eC−B) of TiO2, generated by absorbing photons with energies greater than band gap energy (Egap) leave holes (hV+B) in the valence band. A significant part of these photogenerated electrons can react wgeintheraadtsinogrbseudpOer2ooxnidTeiOra2dsiucraflaacneioorndOis2−so7l-1v1e. dThine the medium, holes on the
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